Course Name: CH5250 : Chemical Engg Principles of CVD Processes

Description: Chemical Vapor deposition (CVD) is a process widely used in hightechnology industries, as well as in more prosaic applications such as glazing of mirrors. The process involves many core chemical engineering disciplines, such as multicomponent mass transfer, heat transfer, chemical reaction engineering and equilibrium thermodynamics. For students that have received basic training in these aspects, this course is intended to provide a practical framework to apply their learning. Introduction: Importance of CVD processes, historical perspective. Basics of CVD: mult-icomponent mass transfer, heat transfer, chemical reactions? thermodynamics, phase equilibria, design and optimization of CVD reactors? effects of impurities in reacting gases and on target substrate? hightemperature CVD processes? effects of CVD deposits on the substrate? dynamics and control of CVD processes? lowpressure CVD (LPCVD) and plasmaenhanced CVD (PECVD). Practical applications of CVD: semiconductors and related devices? microelectronic

Slot: G

RoomNo: MSB240

Instructor: Nagarajan R

Period: JUL-NOV 2013

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